Low-Cost Low-Pressure PlasmaPlasma system Zepto
Flexibly configurable plasma system for laboratory and development use
The Low Cost Zepto system combines a compact design with high functionality for professional plasma applications. With a chamber volume of around 0 - 3 litres, it is ideal for laboratory applications, research and small-batch production.
Start an inquiry
Flexible, Low Cost plasma system for a wide range of applications
The Low Cost plasma system Zepto combines functionality with state-of-the-art technology in a compact housing. With a chamber volume of up to 0 - 3 litres, the system is suitable for a wide variety of components and material samples. Depending on the application, you can choose between a semi-automatic control system or a user-friendly, Low Cost PC control system. This makes plasma processes easy to operate and ensures they can be carried out reproducibly.
The Zepto low-pressure plasma system is used across numerous industries. These include, amongst others, research and development, analytics, medical technology, plastics technology, textile technology and small-batch production. Wherever surfaces need to be cleaned, activated or prepared for subsequent processes, the Zepto delivers reliable results.
Thanks to its combination of compact design, flexible configuration and ease of use, the Zepto is suitable for both laboratory environments and production-oriented development processes.
Cleaning
The Low-Cost Low-Pressure Plasma Zepto laboratory system offers solutions for the sterile ultra-fine cleaning of all surfaces, regardless of the substrate. Plasma cleaning removes all organic residues without subjecting the component to chemical or thermal stress.
More information
Activate
A prerequisite for the adhesion of bonding partners is good surface wettability. Plasma activation in the Low-Cost Low-Pressure Plasma Zepto system takes place immediately after cleaning and increases the surface energy.
More information
0 - 3l chamber
The Zepto plasma system is equipped with a chamber volume of 0 - 3 litres, which is ideally suited to small samples. The compact process chamber ensures a short evacuation time and short process durations, delivering efficient and cost-effective results. The chamber is made of borosilicate glass, which offers exceptional chemical resistance and, consequently, a high degree of purity. Thanks to these properties, the Zepto is ideally suited to applications in medical technology as well as laboratory and research work where high purity standards must be met. In addition, an electrode positioned outside the chamber prevents even the slightest contamination caused by material sputtering. For certain applications, a rotating flask is also available to ensure uniform treatment. With the well-thought-out design of the Zepto, Diener electronic supports the fulfilment of demanding purity requirements and provides the conditions for safe and reproducible processes. There is also the option of an RIE bell-type chamber, which enables reactive ion etching as a dry etching technique. This process is primarily used in the photolithographic manufacture of PDMS chips and in the bonding of lab-on-chip devices. The vacuum chamber of an RIE system is made of aluminium and features a metallic electrode in the centre.
Cost-effective, Low Cost system
The Zepto plasma system combines state-of-the-art plasma technology with a compact housing and an intuitive user interface. Thanks to its compact design, the Zepto can be quickly integrated into a laboratory or research environment. It offers high-performance plasma treatment in a space-saving design. As a cost-effective solution, the plasma system provides an easy introduction to professional plasma surface treatment. The combination of low capital and running costs with consistent process quality enables cost-effective operation in demanding applications.
Simple controls
Despite its state-of-the-art technology, the Zepto is equipped with a straightforward, Low Cost PC control system, which makes it easy to operate. All processes are pre-programmed into the control unit, which runs on Windows CE, meaning that no prior knowledge or extensive training is required. It provides an overview of the current status as well as clear programme management. Its ease of use makes it easy to get started with plasma technology and enables efficient operation.
Technical data
Housing dimensions
Tabletop
Control unit
Semi-automatic
Low Cost PC (Windows CE)
Vacuum chamber
Borosilicate glass, Hinged door
⌀ 105 mm x
D 300 mm; Volume approx. 3 liters
Aluminium, with lid
⌀ 150 mm x
H 60 mm; Volume approx. 1 liters
Generator
40.00 kHz | Power output 0 - 100 W
13.56 MHz | Power output 0 - 200 W
Gas supply
Needle valve
MFC (Mass flow controller)
Electrode
Outside the vacuum chamber
RIE electrode
Pressure measurement
Pirani sensor
Power supply
230 V | 16 A
Technical changes reserved.
Model variants
Zepto
Semi-automatic kHz
Housing dimensions
TabletopW 425 mm x H 185 mm x D 450 mm
Control unit
Semi-automatic
Vacuum chamber
Borosilicate glass
,
Hinged door
⌀ 105 mm x
D 300 mm
Volume approx.
3
liters
Generator
40.00 kHz | Power output 0 - 100 W
Gas supply
2 x Needle valve
Electrode
Outside the vacuum chamber
Pressure measurement
Pirani sensor
Power supply
230 V | 16 A
Zepto
Semi-automatic MHz
Housing dimensions
TabletopW 425 mm x H 185 mm x D 450 mm
Control unit
Semi-automatic
Vacuum chamber
Borosilicate glass
,
Hinged door
⌀ 105 mm x
D 300 mm
Volume approx.
3
liters
Generator
13.56 MHz | Power output 0 - 200 W
Gas supply
2 x Needle valve
Electrode
Outside the vacuum chamber
Pressure measurement
Pirani sensor
Power supply
230 V | 16 A
Zepto
PC kHz
Housing dimensions
TabletopW 425 mm x H 185 mm x D 450 mm
Control unit
Low Cost PC
Vacuum chamber
Borosilicate glass
,
Hinged door
⌀ 105 mm x
D 300 mm
Volume approx.
3
liters
Generator
40.00 kHz | Power output 0 - 100 W
Gas supply
2 x MFC (Mass flow controller)
Electrode
Outside the vacuum chamber
Pressure measurement
Pirani sensor
Power supply
230 V | 16 A
Zepto
PC MHz
Housing dimensions
TabletopW 425 mm x H 185 mm x D 450 mm
Control unit
Low Cost PC
Vacuum chamber
Borosilicate glass
,
Hinged door
⌀ 105 mm x
D 300 mm
Volume approx.
3
liters
Generator
13.56 MHz | Power output 0 - 200 W
Gas supply
2 x MFC (Mass flow controller)
Electrode
Outside the vacuum chamber
Pressure measurement
Pirani sensor
Power supply
230 V | 16 A
Zepto
RIE Semi-automatic MHz
Housing dimensions
TabletopW 425 mm x H 310 mm x D 450 mm
Control unit
Semi-automatic
Vacuum chamber
Aluminium
,
with lid
⌀ 150 mm x
H 60 mm
Volume approx.
1
liters
Generator
13.56 MHz | Power output 0 - 200 W
Gas supply
2 x Needle valve
Electrode
RIE electrode
Pressure measurement
Pirani sensor
Power supply
230 V | 16 A
Housing dimensions
Control unit
Vacuum chamber
Generator
Gas supply
Electrode
Pressure measurement
Power supply
Other interesting products
FAQ Frequently Asked Questions
Is the Zepto plasma system suitable for continuous operation?
The Low Cost Zepto system, designed for research and engineering, is not suitable for continuous operation.
What can be covered using the Zepto?
The Zepto from Diener electronic can be used to process all vacuum-resistant materials.
Can the Zepto be coated using this system?
Unfortunately, with the Zepto system from the Low Cost range, it is not possible to coat the surface.
Can the Zepto be etched using this equipment?
Unfortunately, with the Zepto system from the Low Cost range, it is not possible to etch the surface.
Which gases can be used with the Zepto?
The following gases can be used in the Zepto and, more generally, in low-pressure plasma: O₂, N₂, Ar, ambient air, CO₂, H₂O vapour and forming gas
Can the Zepto system handle magnetic components?
Magnetic components can also be processed effectively in the vacuum chamber of the Zepto from Diener electronic.
Can temperature-sensitive components be processed using the Zepto?
Yes, as this is a cold plasma, the low-pressure plasma systems Zepto from Diener electronic are suitable for temperature-sensitive components.
Can ESD-sensitive components be handled using the Zepto?
Yes, this is possible using low-pressure plasma of the Zepto. A trial can be carried out in our process department on request.
What is the typical pressure range usually found in the vacuum chamber of the Zepto?
The typical pressure range of the Zepto is adjustable from 0.1 to 1.0 mbar, depending on the defined low-pressure plasma process.
What is the typical process temperature for the Zepto in the vacuum chamber?
With the Zepto from Diener electronic, the temperature is normally between room temperature and approximately 80 °C – depending on the component, chamber type, process time and load quantity. Higher temperatures can be achieved on request from Diener electronic using heating elements.
What software integration options are available for the Zepto?
With the Low Cost control unit for Zepto, it is not possible to connect it.
Are exhaust air filters required for the Zepto?
Yes, all systems must be connected to a proper exhaust system, regardless of the type of gas used. Nitrogen oxides, exhaust gases, fine oil mist (from oil pumps), etc. are produced, which must not be inhaled; furthermore, the gases are often acidic, meaning they accelerate the rusting of surrounding parts, machinery and equipment.
Which surfaces can be activated using the Zepto plasma system?
The Zepto plasma system from Diener electronic can be used to activate the following surfaces: plastics, metals, glass, ceramics and textiles.
What is the frequency of the GHz system Zepto?
The generators for the GHz system Zepto operate at an ISM frequency of 2.45 MHz – comparable in intensity to that of a microwave. Please enquire about the safety guidelines for people with pacemakers.
