for plasma systems

Since most of our plasma systems are customised, there are various further options and possibilities for additional equipment to tailor the system to your individual requirements. The systems can be equipped with the following accessories: 

2/2-way valve for liquid dosing

Valve for direct dosing of monomers.

Automatic door

A door which closes automatically at process start.

Heatable chamber

The chamber can be heated to approx. 80 °C. The temperature can be controlled. It is intended for defined process conditions and higher etch rates.

Bubbler bottle

Comprised in the polymerisation accessories, the bubbler bottle is required for connecting liquid monomers to the vacuum chamber. A carrier gas is used instead of the simple monomer bottle. The monomer is purged with a carrier gas, e.g. argon.

Butterfly valve

A butterfly valve is used to regulate a gas flow; in vacuum technology, it is provided primarily in the intake line of a vacuum pump. To this end, the flow resistance in the line is changed by adjusting a valve which can close the line to a small or large degree.

Bar code reader

To track the batches.

Pressure reducer

The pressure reducer is intended for connection to the gas bottle – 200 bar. Different gases require different pressure reducers. One is intended for noble gases H2, O2, CF4, C4F8, one for NH3.

Pressure gauges

Pirani sensor or Baratron – indication of the pressure in the vacuum chamber.

Rotary drum

Product carrier type for loading with bulk goods.

Continuous systems

For integration of a low-pressure plasma system in an automatic processing line.

Spare parts kit, standard or PFPE

The spare parts kit includes 1 clamping ring, 1 seal, 1 stainless steel flexible tube (vacuum tube), 1 window pane, 1 door seal, 10 pieces miniature fuses for the plasma system, as well as 1 litre of mineral oil for the vacuum pump with the standard kit, and 1 litre of PFPE oil for the vacuum pump with the PFPE kit.

Label printer

Automatic printing of labels after the plasma treatment.

Label reader

To track the batches.

ESD protection

ESD stands for electrostatic discharge. On the shop floor, sensitive electronic components must be protected from electrostatic discharges. If you intend to use a plasma system for manufacturing this type of components, the system can be specifically equipped to prevent the occurrence of electrical discharges.

Faraday box / cage

For electrically sensitive components. The components to be treated are in the Faraday cage. It can be removed from the vacuum chamber.

Gas bottle holder

Can be attached to the work table, shelves or wall ledges. Its span width is 70 mm. The strap holds the bottle without any room for play. It is suitable for all bottle sizes.

Spray paint/glass plate set (PWIS-free test)

Additional safety option for workplaces using combustible gases. Accessories for carrying out a paint-wetting impairment test. Scope of delivery: Spray paint in cans, 5 pieces à 400 ml, and glass plates 100 pieces, each 90 mm x 110 mm.

Gas detector for hydrogen

Some plasma processes require hydrogen as a process gas. Accidental leakage of hydrogen caused by a technical defect can become dangerous quickly. The escaping hydrogen may ignite and cause an explosion in the worst case. To prevent this hazard, plasma systems with full PC control can be equipped with a gas detector. It recognises increased hydrogen concentration in the ambient air and raises  alarm. 

Rubber mat

A rubber mat can be ordered to protect the top of the plasma system if you wish to use it as storage space. It protects the plasma system from damage. It furthermore acts as a “non-slip mat” for the parts deposited on the system.

Heating plates

The components to be treated sit on the heating plate, which can be heated to max. 150 °C and is suitable for defined process conditions and higher etching rates. There are two options available:

Equipped with a temperature indicator: A thermal sensor is arranged inside the vacuum chamber for measuring the surface temperature of the component. Equipped with the temperature indicator integrated into the PC control: Here, too, a thermal sensor is arranged inside the vacuum chamber for measuring the surface temperature of the component. The temperature is indicated on the screen.

Quartz glass boat

Available in two dimensions. For ultra high-purity plasma processes or wafer treatment.

Slow ventilation of the vacuum chamber

The vacuum chamber is vented at slow speed by means of a filter. This prevents small components from spinning around in the chamber.

Output indication

Indicates the output of the generator. Analog display device.

Multi-tier electrode

The multi-tier electrode is available for round and/or rectangular vacuum chambers. Several components can be treated at the same time. Suitable for standard plasma processes. Please contact Diener electronic regarding the exact design of your individual electrode and other materials for manufacture of the product carriers.

Micro-dosing pump

Micro-dosing pumps are used to feed liquid monomers into the vacuum chamber. This technology allows for highly accurate regulation of the monomer feed into the vacuum chamber.

Microwave leak tester

For microwave systems, it may be advisable to provide a microwave leak tester as a protection from hazardous radiation.

Monomer bottle

Polymerisation accessories. To connect liquid monomers to the vacuum chamber.

OES - Optical emission spectrometer

Monitoring of the plasma process for quality assurance. Detection of the end point of the plasma process. OES is available only for systems with PC control.

Process gas bottle

Oxygen bottle for connection as process gas with capacity 2, 5 and 10 litres, hydrogen bottle with capacity 2 litres, Argon bottle with capacity 5 litres. Special transport conditions apply for the supply of gas. Gas bottles for rental systems must be bought.

RIE electrode

Circular or rectangular stainless steel electrode, for higher etch rates. Suitable for anisotropic and isotropic etching.

RIE electrode with gas shower

Rectangular stainless steel electrode. Achieves higher etch rates due to more homogeneous gas distribution.
Used in anisotropic etching processes.

Roll-to-roll system

e.g. for handling of foils / lead frames.

Robot automation

Diener electronic offers its customers the suitable automation solution for every process, whether cleaning, activating, etching or coating. All processes can be automated autonomously or in a fully integrated manner. To this end, Diener electronic offers fully automatic low-pressure plasma systems and fully automatic atmospheric pressure plasma systems. Tailored to the requirements, automatic product carriers, articulated or 3-axes robots are used.

For implementation of the automation, we can resort to experienced partners who know how to realize also complex and fully integrated automation solutions. 

Oxygen generator

Oxygen is generated from the ambient air. Type Kröber O2. Oxygen output: 3-6 l/min.

Safety valve

For operation with combustible gases such as hydrogen, ethyne etc.

Special flanges / additional flanges

Special flanges are used if more than the connections are required as provided as a standard.

Special electrodes and product carriers

Please contact Diener electronic regarding the exact design of your individual electrode and other materials for manufacture of the product carriers.

Special vacuum chambers

In accordance with DIN 12198, a UV irradiation measurement was performed on our systems (inspection glass). Result: harmless. Special vacuum chambers are available in round form with a lid and rectangular form with hinged door. Made of aluminium, they also have different opening diameters and inner dimensions. Please do not hesitate to ask for advice.

Circular or rectangular standard electrode

Made of stainless steel/aluminium plate for standard plasma processes.

TEM sample holder

Special device for insertion into the plasma chamber from outside. Can be manufactured in any size. Please inform us of the dimensions of your parts, or submit drawings.

Digital temperature indicator

A thermal sensor is arranged inside the vacuum chamber. The temperature in the vacuum chamber is indicated on a separate display.

Temperature indicator for the chamber temperature without heating plate. Can be used to measure the surface temperature of the components. The temperature indicator can also be integrated in the PC control. In this case, the temperature is indicated on the screen.

Temperature indicator, integrated in the PC control

A thermal sensor is arranged inside the vacuum chamber.

The temperature in the chamber is indicated directly in the system control.

Dry-running vacuum pumps for plasma processes with corrosive gases

For processes with corrosive gases, dry-running pumps can also be used. However, these must then be specially designed for this high load. They can also cope with  particle, condensation or corrosion by-products. The benefit of the dry-running pump is its optimised utilities consumption. The pumps require no preventive maintenance (oil change).

Stainless steel vacuum chambers

Stainless steel vacuum chambers are for standard plasma processes.

Glass vacuum chambers (borosilicate or quartz)

Borosilicate glass vacuum chambers are for high-purity plasma processes. Quartz glass vacuum chambers are for ultra high-purity plasma processes.

Device for treating powder

Powder is treated in a rotating glass bottle. For filling, the bottle can be removed from the system.

Laundry bag

For pre-cleaning of small items in the washing machine. Dimensions: 500 mm x 300 mm. 


For initial cleaning of small items before plasma treatment. Only required for heavily soiled items. Manufacturer: Miele: Type WT 2670 WPM.

Product carriers

In the plasma system, the items rest on so-called product carriers. They are manufactured individually to match the type of parts and process. Often, double the number of product carriers is manufactured for a system so that the next product carriers can be loaded with items while the first batch is being processed.

Additional glass channels

Needle valves: Our systems can be equipped with any number of needle valves. By default, a Femto plasma system is equipped with 1-3 needle valves, but more are possible on request.

Additional MFCs

MFCs: The controls require Full PC and Basic PC. Our systems can be equipped with any number of mass flow controllers (MFCs).

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