Tetra 320R

Low-pressure plasma systems (PlasmaCleaner)

The  Tetra 320R production system with its chamber volume of 320 litres and PC control is used in series production (cleaning, etching and activation):

Technical data

Control cabinet: W 870 mm, H (with feet) 1860 mm, D 1400 mm

Chamber: ∅ 640 mm, D 1000 mm

Chamber volume: approx. 320 litres

Gas supply: 2 gas channels via MFCs

Generator: 1 pc. (80 kHz/ 300 Watt)

Control: PC control (Windows)

Parts holding fixture: according to customer requirements

Possibilities of plasma treatment

Materials cleaning

Plasma technology offers solutions for any type of contamination, for any substrate and any post-treatment. In the process, molecular contamination residues are decomposed as well.

LEARN MORE ABOUT CLEANING

Activation of materials

Good wettability is a prerequisite for the adhesion of binding partners in painting, gluing, printing or bonding.

LEARN MORE ABOUT ACTIVATION

Etching materials

Plasma technology allows for anisotropic and isotropic etching. Isotropic etching is done by chemical etching and anisotropic etching by physical etching.

LEARN MORE ABOUT ETCHING

Coating of materials

With low-pressure plasmas, components can be tempered with various coats. This is done by supplying gaseous and liquid starting substances into the vacuum chamber.

LEARN MORE ABOUT COATING

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