Glossary of surface technology

Barrel plasma etcher

High etching rates with anisotropic plasma etching can be achieved primarily in the barrel reactor with HF excitation in a MHz band. For this reason, plasma systems intended primarily or exclusively for plasma etching are preferably designed as barrel reactors. Barrel plasma etchers are for example used in photoresist ashing. eingesetzt. For more details, go to ⇒ Barrel reactor

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