Zepto (Low Cost / Low Budget)
Low-Pressure Plasma System (Plasma Cleaner)
Start an Inquiry Datasheet (PDF)
The 2.6 litre LOW-COST PLASMA LAB SYSTEM ZEPTO with manual and Basic PC control is primarily intended for the following applications:
Small batch production, Analytics (SEM, TEM), Medical engineering, Sterilising, Research and development departments, Archaeology, Textile technology, Plastics technology
Plasma processes
Materials cleaning
Plasma technology offers solutions for any type of contamination, for any substrate and any post-treatment. In the process, molecular contamination residues are decomposed as well.
Activation of materials
Good wettability is a prerequisite for the adhesion of binding partners in painting, gluing, printing or bonding.
Technical data
Zepto One
Semi-automatic kHz / Semi-automatic MHz
Dimensions
W: 269 mm H: 176 mm D: 324 mm
Power supply
230 V | 16 A
Vacuum chamber
Borosilicate glass
round, with lid
Ø: 105 mm
D: 200 mm
Volume approx. 1.7 L
Gas supply
1 x needle valve
Generator
100 kHz | Power output 0 - 30 W
13,56 MHz | Power output 0 - 30 W
Electrode
Electrode pair outside the vacuum chamber
Control unit
Semi-automatic control unit
Power supply
230 V | 50 - 60 Hz
Pressure measurement
-
Pump
Suction capacity min. 3 m³/h
Zepto
Semi-automatic kHz / Semi-automatic MHz
Dimensions
W: 425 mm H: 185 mm D: 450 mm
Power supply
Vacuum chamber
Borosilicate glass
round, Hinged door
Ø: 105 mm
D: 300 mm
Volume approx. 2.6 L
Gas supply
2 x needle valve
Generator
40 kHz | Power output 0 - 100 W
13,56 MHz | Power output 0 - 200 W
Electrode
Electrode pair outside the vacuum chamber
Control unit
Semi-automatic control unit
Power supply
230 V | 50 - 60 Hz
Pressure measurement
Pirani
Pump
Suction capacity min. 3 m³/h
Zepto
PC kHz / PC MHz
Dimensions
W: 425 mm H: 185 mm D: 450 mm
Power supply
Vacuum chamber
Borosilicate glass
round, Hinged door
Ø: 105 mm
D: 300 mm
Volume approx. 2.6 L
Gas supply
2 x MFC
Generator
40 kHz | Power output 0 - 100 W
13,56 MHz | Power output 0 - 200 W
Electrode
Electrode pair outside the vacuum chamber
Control unit
7" Basic PC control unit (Windows Embedded Compact 7)
Power supply
230 V | 50 - 60 Hz
Pressure measurement
Pirani
Pump
Suction capacity min. 3 m³/h
Zepto RIE
Semi-automatic MHz
Dimensions
W: 425 mm H: 310 mm D: 450 mm
Power supply
230 V | 16 A
Vacuum chamber
Aluminium
round, with lid
Ø: 190 mm
H: 60 mm
Volume approx. 1 L
Gas supply
2 x needle valve
Generator
13,56 MHz | Power output 0 - 200 W
Electrode
Electrode inside the vacuum chamber - Ø: 160 mm for max. 6" wafer
Control unit
Semi-automatic control unit
Power supply
230 V | 50 - 60 Hz
Pressure measurement
Pirani
Pump
Suction capacity min. 3 m³/h
