The Tetra 1440 production system with its 1440 liters of chamber volume and PC control is used in series production (cleaning, etching and activation):
Technical data
Housing: W 2400 mm, H 2130mm, D 2000 mm (modularly expandable in 500mm steps)
Chamber: W 1200 mm, H 1200mm, D 1000 mm (modularly expandable in 500mm steps)
Chamber volume: approx. 1440 liters
Gas supply: according to customer requirements
Generator: 1 piece (80 kHz/ 5000 Watt)
Control: PC control (Windows)
Parts intake: according to customer requirements
Plasma processes
Materials cleaning
Plasma technology offers solutions for any type of contamination, for any substrate and any post-treatment. In the process, molecular contamination residues are decomposed as well.
Activation of materials
Good wettability is a prerequisite for the adhesion of binding partners in painting, gluing, printing or bonding.
Etching materials
Plasma technology allows for anisotropic and isotropic etching. Isotropic etching is done by chemical etching and anisotropic etching by physical etching.
Coating of materials
With low-pressure plasmas, components can be tempered with various coats. This is done by supplying gaseous and liquid starting substances into the vacuum chamber.
