CF4 Tetrafluormethane, known primarily by the trade name Freon 14 (Dupont). CF 4 is a process gas frequently used for coating processes by means of plasma polymerisation . It is used for the generatio
Material removal Removing of material from a surface, in particular by means of a plasma etching process . By different processes such as chemical etching , ion etching , reactive ion etching or micro
Painting aluminium Since aluminium is a highly reactive metal, it always has an oxide coat in a free atmosphere. For this reason, a plasma treatment , in particular plasma cleaning in the hydrogen pla
Anodic bonding Bonding process in the semiconductor, sensor, and micro-system technology for inseparable bonding of two very smooth plates between which a very close contact must be provided. One of t
Aluminium oxide 2 O 3 , hard oxide occurring in various modifications; of these, corundum has the greatest hardness. In contact with atmospheric oxygen, a thin transparent Al 2 O 3 coat is formed spon
Cleaning aluminium The surface of aluminium has a passivating oxide coat but tends to adsorp organic contaminations. With a plasma process, the adsorbates and the oxide coat can be removed in a single
surfaces and strong adsorption capacity. Activated carbon is used in chemically active filters. Diener electronic provides charcoal filters in order to prevent from exhaust of toxic gase.
which is in contact with it is based on a number of active species such as ions , free radicals , electrons , excited atoms and photons .
Etching mask To restrict the etching of a substrate to some areas, the remaining areas must be covered with a mask. abgedeckt werden. The mask itself must be resistant to the etching process. For the
Advanced composites advanced composites, continuous reinforcement fibres of extreme stiffness and/or strength are embedded aligned in a (plastic, metal, ceramic) matrix material. In this way, the high