Pico plasma system for process development
Used Pico plasma system, for process development, cleaning, activation, etching in small batches - Diener plasma systems

Pico plasma system, used

Technical data

Housing
W 560 mm, H 600 mm, D 600 mm

Chamber
Stainless steel, round
(approx. W 150 mm, H 150 mm, D 325 mm)

Chamber volume:
approx. 5.74 litres

Gas supply
via Mass Flow Controller (MFCs)

Generator
1 piece (150 W)

Control
PC (Windows XPe)