Rental system NANO UHP
Nano UHP small system with semi-automatic control: Cleaning, activating, etching, coating

Rental system NANO UHP

The NANO UHP small system, with its 18-litre chamber volume and semi-automatic control, is mainly used in the following areas:

  • Small batch production
  • Analytics (REM, TEM)
  • Electronics
  • Medical technology
  • Plastics
  • Elastomer technology
  • Research and development

 

UHP stands for Ultra High Purity. This designation applies to the glass vacuum chambers of our plasma systems. These can be borosilicate glass or quartz glass according to customer wishes. The option of UHP is only available for the following systems: Femto, Pico and Nano.

Glass chambers are implemented in microwave systems and/or with applications which require an ultra-pure surface. Normal stainless steel or aluminium chambers may sputter to a very small degree, like all metals in a plasma system, including the product treated. For most processes, this is not important and entirely negligible. The aluminium parts from the UHP system are coated with AL2O3. Since the system does not have a stainless steel vacuum chamber, it is suitable for applications in which traces of chromium, nickel and iron are a disturbance.

Technical data:

Switch cabinet:
W 580 mm, H 650 mm, D 600 mm

chamber:
∅ 240 mm, L 400 mm
(optional: L 600 mm)
chamber opening: ∅ 230 mm
materials: Quartz or borosilicate glass
Front and rear walls of the chamber: Aluminium

Chamber volume:
approx. 18 litres

Gas supply:
2 gas channels via needle valves

Generator:
40 kHz/300 W, continuous
(optional: 13.56 MHz or 2.45 GHz)

Vacuum pump:
Leybold, type D8B ( 8 m3/h)

Parts holding:
1 piece product carrier:

Control:
semi-automatic, process time via timer

Options/accessories