2.45 GHz microwave coupling for plasma applications

Microwave coupling from Diener electronic
Microwave emitter with HF
Microwave emitter in the chamber
Microwave emitter in the chamber
Microwave emitter in the chamber Plasma cleaner
Microwave emitter in the chamber

Microwave coupling from Diener electronic

Please contact us for technical advice regarding this system:

  • HF power range of up to 1250 watts depending on the magnetron used, which may be selected from a variety of available power classes (300 W, 850 W and 1200 W)
  • The intensity of the microwave plasma is continuously adjustable from the respective adjustable ignition point (minimum) to the upper power limit of the selected magnetron (max)
  • The emission duration is practically continuously variable, depending on the dimensions of the vacuum chamber
  • Preferable emitter diameter 8 mm for a glass body diameter of 32 mm
  • Installation of microwave coupling using KF40 welded vacuum small flange on the rear wall of the plasma chamber
  • Air cooling of the radiating element is possible
  • Design as a compact unit: Magnetron - waveguide - emitter
  • Power supply by means of a controllable brand name switching power supply
  • Mains voltage: 230 V +/- 10 % / 50 Hz
  • Power range 1 kW or 1.2 kW
  • Analogue control voltage: 0 - 10 V
  • Controllability of the microwave coupling via plasma system PC
  • Available in different variants