For a plasma system to work, it needs a generator. Which frequency is best for the desired plasma treatment cannot be answered in general terms, but must be decided on a case by case basis. Diener has been offering plasma generators with a frequency of between 50 kHz and 2.45 GHz in its product range for many years, now 13.56 MHz generators have been specially developed and produced, which come with 100 and 300 watt versions.
Advantages of 13.56 MHz generators:
- RIE operation possible
- Homogeneity is better than at 2.45 GHz
- Etching rate is higher for the same power than at 40 kHz
- Metal rotary drums can be easily used
- Electrodes/product carriers can be constructed, but the balancing of the electrodes is very laborious
- Good for front-end and back-end semiconductor processes
- High deposition rates for plasma polymerization processes
Main applications areas for both powers are plasma applications for activation, cleaning, etching, semiconductor (front-end), semiconductor (back-end) and plasma polymerization. Impedance matching can be achieved either manually (manual matching) or automatically (auto matching) and is necessary in all cases, which is why the HF system consists of a generator and matching.
During manual matching, the matching process must be set at each process start and checked and adjusted sporadically during the process; the capacitors are automatically adjusted and readjusted following changes.
In addition, it is also possible to display the forward and reverse power, safety shutdown via the door switch and vacuum safety switch, quartz-stabilized frequency to comply with EN 55011 and a PC interface.
Click here to learn more about the individual generators:
LFG generator - 500 W (80 kHz)
LFG generator - 1200 W (80 kHz)
LFG generator - 3000 W (80 kHz)
LFG generator - 5000 W (80 kHz)
MW generator - 850 W (2.45 GHz)