1. How does etching using plasma work?
In plasma etching, process gases are used which can convert the material to be etched into the gas phase. Gas enriched with the base material is pumped out and fresh process gas is supplied. Continuous removal is therefore achieved. Resistant masking (e.g. with chromium) can be used to protect areas against the process gas. A surface can be structured by targeting in this way. This structuring is on the nanometer scale.