Plasma etching can remove hydrocarbon coatings very effectively. This effect is used for plasma cleaning to remove waxes, silicone, grease and release agents.

However also complete polymeric surfaces can be removed completely and effectively. For example a polymeric matrix of a composite material can be removed to analyse the anorganic component.

The most important "ashing" process however is the elimination of fotoreseist layers after a fotolitographic process.

A plasmaasher is a low pressure plasma system optimized for the plasma ashing process.



A plasma asher can remove fotoresist layers after a fotolithographic process.