Micro Sandblasting

Ions which impact a substrates sccelerated by a stativ electric field but which are not envolved in chemical reaction with the substrate material cause physical etching very similar to a minimized sandplasting effect. The impacts remove atoms or molecules which can be components of the substrate or of a coating or of a contamination. The micro sandblasting effect is not selective because it treats any chemical compound.

Physical Etching
Argon by virtue beeing an inert gas is optimum for physical etching because it does not generate chemical reactions.