Plasma based metal surface treatment method. The first step is plasma surface cleaning by ion bombardment. Afterwards, metal vapour generated in an evaporater which is partly ionised by a plasma is introduced and accelerated towards the preheated substrate by a negative bias voltage. Thus, a layer of the evaporated metal grows on the substrate, while parts of the layer and the substrate keep being sputtered off by the ion bombardment. The structure of the resulting layer is highly dependent of the substrate's temperature.