chemical etching

Removing material from a substrate caused by chemical reaction.

The reactive agent may be an etching fluid like an acid or a solvent.

Cemical Dry Etching (CDE) is caused by the active species of the plasma of a process gas which react with the molecules  of the surface.

The process gas shall be carefully selected for the specific substrate and process (selective etching). Chemical etching is isotropic (not oriented.)

chemical dry etching
Chemical Dry Etching is isotropic and selective