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In microelectronics, the terms refers to an etched structure, generally in a dielectric, often SiO2, through which contact with deeper layers is made or in which a conductor is laid by means of metallisation.
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In microelectronics, the terms refers to an etched structure, generally in a dielectric, often SiO2, through which contact with deeper layers is made or in which a conductor is laid by means of metallisation.
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