PACVD (PECVD)

In chemical vapour deposition (CVD), a solid layer is formed on a substrate surface by gaseous molecules reacting through the heat of the substrate. With plasma-assisted CVD (PACVD), the UV radiation from the process gas molecules generates radicals which react on the surface also without temperature acting on them.
For this reason, PACVD – contrary to CVD – can also be used on substrates with a low thermal resistance. Sometimes PACVD is also referred to as PECVD (Plasma Enhanced CVD).

back to glossary

+49 (0)7458 99931-0

Get an expert on the phone

info@plasma.com

Write us what we can do for you

Request a quotation

You know exactly what you’re looking for