PACVD (PECVD)

In chemical vapour deposition (CVD), a solid layer is formed on a substrate surface by gaseous molecules reacting through the heat of the substrate. With plasma-assisted CVD (PACVD), the UV radiation from the process gas molecules generates radicals which react on the surface also without temperature acting on them.
For this reason, PACVD – contrary to CVD – can also be used on substrates with a low thermal resistance. Sometimes PACVD is also referred to as PECVD (Plasma Enhanced CVD).