Structured film or coat on a surface or substrate. The structure of the mask provides for local treatment of the substrate. In microelectronics, masks with ultra-fine structures are manufactured primarily by photolithography. erzeugt. Through the gaps in thephotoresistlayer, the substrate is treated in particular by reactive ion etching (RIE). bearbeitet. Following structuring, the photoresist mask is stripped off by plasma etching. entfernt.