The vacuum chamber is a pressure-tight pressure reservoir. To prevent vacuum chamber components from being etched by the plasma, they are made from stainless steel or highly pure silica glass. This also applies to the components inside the vacuum chamber: electrodes, product carriers, sensors. The vacuum chamber also comprises the electronic system control and all gas and exhaust gas connections.
HF generators in LF range (40 kHz), RF range (13.56 MHz) and microwave range (2.45 GHz) are available for plasma excitation.
The pump unit comprises for example pre- and high-vacuum pump, filters, tubes, and measuring sensors.