Tetrafluormethane, known primarily by the trade name Freon 14 (Dupont). CF4 is a process gas frequently used for coating processes by means of plasma polymerisation. It is used for the generation of fluorinated surfaces, in particular for epilamisation, i.e. the production of a perfluorinated surface.
Tetrafluormethane CF4 corresponds to the methane molecule in which all 4 hydrogen bonds are replaced by fluorine. <br/>In plasma processes , this is a frequently used process gas, particularly for etching. Tetrafluormethane (CF4, also referred to as Freon 14) is completely inert under normal conditions. In the plasma, however, it forms free fluorine atoms and CF2 and CF3 radicals. These have a very significant etching effect, e.g. on silicon dioxide. Mixtures of CF4 and O2 etch approximately 5 times faster than pure oxygen.