CDE Chemical Dry Etching

Chemical dry etching. CDE is a common acronym for the chemical plasma etching process, also called “chemical etching” or “plasma etching”. Chemical dry etching takes place in the plasma by means of the reaction of active species (excited atoms, radicals, ions) with the substrate molecules. The process gas must be adapted to the substrate (selective etching process), the etching process is non-directional (isotropic).

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